Training: ESP Basecamp 2023
April 24 - April 28, 2023
April 24 to 28, 2023. Online
This training course covers details on the process design kit (PDK) of Electronic Sensor Platform (ESP) along with an introduction to L-Edit, MEMSPro.
The Electronic Sensor Platform consists of open-gate silicon junction field-effect transistors (Si JFET) to enable on-chip integration of functional soft materials with microelectronics. The transistors are fabricated without the top gate electrode, such that a transducing soft material can be applied in the place of the gate during post-processing. Different materials like graphene, biomolecules, or quantum dots can be used as the transducing material. This platform has applications in optical detection, for pH and insulin sensing, biomarker detection, as an ambient gas/radiation sensor etc.
CMC has developed a process design kit for the electronic sensor platform. The kit consists of a user guide, L-edit layout template, reference designs and simulation files in Synopsys Sentaurus and COMSOL. There will be a detailed discussion on the different components of the PDK and how to use it to develop your layout. We will also cover topics on best practices to follow to develop your layout to make it foundry ready and take into aspects of integration and packaging.
L- Edit includes a fully hierarchical and full custom editor engineered for MEMS and IC design. L-Edit is a layout tool that represents the masks that are used to fabricate an integrated circuit. In L-Edit, layers are associated with masks used in the fabrication process. Different layers can be conveniently represented by different colours and patterns. L-Edit describes a layout design in terms of files, cells, instances, and mask primitives. Popular output formats are supported so mask designs are “foundry ready”. Learn more about L-Edit.
MEMS Pro is a flexible, powerful, easy-to-use CAD tool suite for the design and analysis of micro-electro-mechanical systems (MEMS). It offers an integrated solution for the design process that shortens development time while providing designers reliable analysis for manufacture. Functionalities include mixed MEMS/IC schematic capture and simulation, full custom mask layout capability and verification, 3D model generation and visualization, behavioural model creation and links to 3D analysis packages.
|April 24 to 28, 2023||
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