Gore filters for semiconductor apps

This new family of 20nm- to 100nm-rated cartridge filters incorporates a new high-flow ePTFE (expanded polytetrafluoroethylene) filtration media that allows a drop-in retention upgrade from 100nm to 30nm, enabling cleaner recirculation baths, reduced processing times and reduced cost of ownership.

Gore will be introducing these new filters at SEMICON West 2009, July 14-16. They have been named by as one of the five finalists for the 2009 “Best of West” awards, which recognize important product and technology developments in the microelectronics supply chain. Gore’s filters were chosen by a distinguished panel of judges from academia, industry and SEMI, the global industry association serving the manufacturing supply chains for the microelectronic, display and photovoltaic industries.

http://www.gore.com/en_xx/products/filtration/microelectronic/semicon/semiconductors_filtration.html